新型射频等离子化学气相沉积系统  

A New RF--PCVD System

作　　者：曲承林[1] 谢雁[1] 李世直[1] 

机构地区：[1]青岛化工学院等离子体表面技术研究所

出　　处：《青岛化工学院学报（自然科学版）》1992年第1期51-55,共5页Journal of Qingdao Institute of Chemical Technology(Natural Science Edition)

基　　金：国家自然科学基金

摘　　要：设计了一种射频电极作为基板支架的射频等离子体化学气相沉积系统.其温度可达700℃,负偏压是可调的.并以沉积的TiN膜的取向为例说明了系统的工作情况.An RF-PCVD system has been designed in which the RF-powered terminal is connected to the sample holder.The temperature of the sample holder can reach 700℃ and the negative bias is adjustable,The change in the degree of preferred orintation of the TiN films as a function of the apparent plasma bias is taken for an example to show the operation of the RF-PCYD system.

关 键 词：射频 等离子体 化学系统 气相沉积 

分 类 号：O646.9[理学—物理化学]