光学光刻的波前工程  

The Wave Front of Optical Lithograptly

作　　者：翁寿松[1] 

机构地区：[1]无锡市罗特电子有限公司,江苏无锡214002

出　　处：《电子工业专用设备》2003年第5期50-52,共3页Equipment for Electronic Products Manufacturing

摘　　要：介绍了国内研究光学光刻波前工程的一些成果,如新型移相掩模、投影光刻的邻近效应和掩模加工的邻近效应的组合模拟等。In this paper,the achievements in scientific research for the wave front of optical lithoyraphy in home are introduced.It includes The new ntase-shift mask and combined simulation for the optical prox-imity effects of projection optical lithography and mask processing.

关 键 词：光学光刻 波前工程 移相掩模 光学邻近效应校正 

分 类 号：TN305.7[电子电信—物理电子学]