氧化物激光薄膜的离子束溅射制备技术  

Technology of the high laser reflectivity oxide coatings deposition by ion-beam sputtering

作　　者：申林[1] 熊胜明[1] 刘洪祥[1] 李凌辉[1] 张云洞[1] 

机构地区：[1]中国科学院光电技术研究所,四川成都610209

出　　处：《强激光与粒子束》2003年第12期1175-1180,共6页High Power Laser and Particle Beams

基　　金：国家863计划项目资助课题

摘　　要：　研究了由Ta2O5和SiO2组成的多层氧化物激光薄膜的双离子束溅射制备工艺。简要介绍了离子束溅射技术的基本工作原理和应用,着重分析了薄膜厚度均匀性的调控方法。先后得到了Ta2O5和SiO2单层薄膜厚度均匀性调控结果以及不同波长处薄膜折射率,并定性地分析比较了离子束溅射和电子束蒸发制备的薄膜结构;制备并测试了633nm,1315nm反射薄膜以及增透膜。结果表明:采用离子束溅射技术能够制备出优良的、满足需要的激光高反射薄膜元件。The oxide laser reflecting multi-layers of Ta_2O_5 and SiO_2 were prepared by double ion-beams sputtering method. The deposition techniques, the uniformity of layer thickness, and the optical charactes were studied. A uniform distribution is achieved by means of changing the tilt degree of substrate and the oscillating degree of the target. In addition, the refractive index, the structure of the layers, center wavelength of 633nm and 1 315nm baffle-board, AR coatings and times control method were presented and discussed.

关 键 词：离子束溅射 厚度均匀性 激光高反射薄膜 增透膜 

分 类 号：TN244[电子电信—物理电子学] O484[理学—固体物理]