氟化非晶碳(a-C:F)薄膜的研究  

A Review of Research on Fluorinated Amorphous Carbon Thin Films

作　　者：刘雄飞[1] 肖剑荣[1] 李幼真[1] 张云芳[1] 

机构地区：[1]中南大学物理科学与技术学院,长沙410083

出　　处：《材料导报》2003年第10期48-50,共3页Materials Reports

摘　　要：氟化非晶碳(a-C:F)薄膜是一种电、光学新材料。介绍了它的制备方法,对其制备工艺作了较全面的探讨;分析了该膜制备方法和工艺参数对薄膜组分及化学键结构的影响;研究了该膜的电学、光学、热学、力学等物理性质及其在相关方面的应用,并对该膜的物理性质与制备工艺参数的关联作了详细的论述;指出介电常数和热稳定性的矛盾是阻碍该膜实用化的主要原因。Fluorinated amorphous carbon thin films are a group of new materials used in the electrical and optical fields. In this paper,the preparation methods of these films are described and the deposition conditions are considered comprehensively. The influence of preparation methods and deposition conditions on the film composition and the bonding structures are analyzed. The authors also review the electrical,optical,calorific and mechanical properties and applications of the films,and discuss the relationship between the physical properties and deposition conditions in details. We point out that striking a proper trade-off between dielectric constant and thermal stability is the key to commercial application of the films.

关 键 词：氟化非晶碳薄膜 热稳定性 物理性质 介电常数 化学气相沉积 CVD 

分 类 号：TN304.055[电子电信—物理电子学]