N_2分压对磁控溅射NbN薄膜微结构与力学性能的影响  

Effect of N_2 Partial Pressure on the Microstructure andMechanical Properties of Magnetron Sputtered NbN Thin Films

作　　者：韩增虎[1] 胡晓萍[1] 田家万[1] 李戈扬[1] 顾明元[1] 

机构地区：[1]上海交通大学金属基复合材料国家重点实验室,上海200030

出　　处：《上海交通大学学报》2004年第1期120-124,共5页Journal of Shanghai Jiaotong University

摘　　要：采用反应磁控溅射法在不同的氮分压下制备了一系列NbN薄膜.用XRD和TEM表征了薄膜的相组成和微观结构,力学探针测量了薄膜的硬度和弹性模量,AFM观察了薄膜的表面形貌并测量了压痕尺寸以校验硬度值的准确性.研究了氮分压对薄膜相组成、微结构和力学性能的影响.结果表明,氮分压对薄膜的沉积速率、相组成、硬度和弹性模量均有明显的影响:低氮分压下,薄膜的沉积速率较高,制备的薄膜样品为六方β-Nb2N和立方δ-NbN两相结构;随氮分压的升高,薄膜形成δ-NbN单相组织,相应地,薄膜获得最高的硬度(36.6GPa)和弹性模量(457GPa);进一步升高氮分压,获得的薄膜为δ-NbN和六方ε-NbN的两相组织,其硬度和模量亦有所降低.NbN thin films were deposited at room temperature with reactive magnetron sputtering method at different N2 partial pressure. X-ray diffraction analysis, transmission electron microscopy and atomic force microscopy were employed to characterize their phases, microstructure and surface morphology. Their microhardness and elastic modulus were evaluated using a microhardness tester and the effect of N2 partial pressure on the phase formation, microstructure and mechanical properties of NbN thin films was investigated. The results show that there is an obvious effect of N2 partial pressure on the deposition rate, phases, hardness and elastic modulus of magnetron NbN films: at a low N2 partial pressure, the deposition rate is higher and hcp β-Nb2N and fee δ-NbN coexist in NbN films; with the increase of N2 pressure, the films are single-phase fcc δ-NbN and accordingly, the hardness and modulus reach peak values of 36.6 GPa and 457 GPa respectively; with a further increase of N2 partial pressure, there are fcc δ-NbN and hcp Ε-NbN in NbN films and the hardness and modulus of films decrease.

关 键 词：NbN薄膜 微结构 力学性能 磁控溅射 

分 类 号：O484[理学—固体物理]