波前分割无掩模激光干涉光刻的实现方法  

Implementation Methods for Wave-Front Division in Maskless Laser Interference Photolithography

作　　者：冯伯儒[1] 张锦[1,2] 郭永康[3] 

机构地区：[1]中国科学院光电技术研究所微细加工光学技术国家重点实验室 [2]四川大学物理系,四川成都610064 [3]四川大学物理系

出　　处：《光电工程》2004年第2期8-10,共3页Opto-Electronic Engineering

基　　金：国家自然科学基金资助项目(60076019)

摘　　要：激光干涉光刻不受传统光学光刻系统光源和数值孔径的限制,其极限尺寸CD达到曝光波长 的1/4,研究了波前分割双光束、三光束方法及四光束无掩模激光干涉光刻方法,提出了可用于五光束和多种多光束和多次曝光的梯形棱镜波前分割干涉光刻方法。用自行建立的梯形棱镜波前分割系统进行了多光束干涉曝光实验,得到孔尺寸约220nm的阵列图形。Laser interference photolithography will not limited by light source and numerical aperture of the traditional optical lithographic system. Its limited size CD has attained 1/4 of the exposure wavelength. Wave-front division maskless laser interference photolithography with double-beam, three-beam and four-beam is studied. A wave-front division interference photolithographic method with trapezoid prism that can be applied to five-beam, a lot of multi-beam and multi-exposure is proposed. Multi-beam interference exposure experiments have been carried out by a self established wave-front division system with trapezoid prism and array patterns with about 220nm hole size have been obtained.

关 键 词：干涉光刻 激光光刻 无掩模 波前分割 

分 类 号：TN305.7[电子电信—物理电子学]