振幅分割无掩模激光干涉光刻的实现方法  

Implementation Methods for Amplitude Division Maskless Laser Interference Photolithography

作　　者：张锦[1,2] 冯伯儒[1] 郭永康[3] 

机构地区：[1]中国科学院光电技术研究所微细加工光学技术国家重点实验室 [2]四川大学物理系,四川成都610064 [3]四川大学物理系

出　　处：《光电工程》2004年第2期11-15,共5页Opto-Electronic Engineering

基　　金：国家自然科学基金资助项目(60076019)。

摘　　要：无掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。研究和比较了振幅分割无 掩模激光干涉光刻方法和系统,包括振幅分割双光束干涉系统、三光束干涉系统、液浸式深紫外干涉系统及全自动干涉光刻系统。建立了双光束双曝光干涉光刻实验系统。模拟和实验结果表明,对点阵或孔阵图形,在同样的图形尺度下,无掩模干涉光刻比传统光刻简单得多。The beam division method in maskless laser interference photolithography can be divided into wave-front division and amplitude division. The methods and systems (including amplitude division double-beam interference system, three-beam interference system, liquid immersion type deep UV interference system and full automatic interference photolithographic system) for amplitude division maskless laser interference photolithography are studied and compared. An experimental double-beam and double-exposure interference photolithographic system has been established. Simulation and experiments show that for point array or hole array patterns with the same sizes maskless interference photolithography is much simple than the traditional photolithography.

关 键 词：干涉光刻 激光光刻 振幅分割 无掩模 

分 类 号：TN305.7[电子电信—物理电子学]