自动控制离子束溅射沉积光学薄膜系统设计  

Design of autocontrol coating process for ion beam sputter system

作　　者：刘洪祥[1] 李凌辉[1] 申林[1] 熊胜明[1] 张云洞[1] 

机构地区：[1]中国科学院光电技术研究所,四川成都610209

出　　处：《光学仪器》2004年第2期83-86,共4页Optical Instruments

摘　　要：利用射频离子源RF—2001控制器USERINTERFACE接口具有遥控开关控制的功能,采用继电器控制输出及开关量隔离输入卡DAC—7325E,通过光电传感器对靶转动定位、行星转动系统的监控,在国产IBSD—1000型离子束溅射镀膜系统上,首次成功地实现了单、双离子束溅射沉积镀膜过程的自动化控制。控制软件采用VB编程,程序控制界面直观、易于操作。Utilizing the remote switch of USER INTERFACE connector of RF—2001 controller, we make use of the DAC—7325E control card, and realize the program autocontrol of ion source. According to the characteristics of the device, for IBSD—1000 ion beam sputter system, we utilize the photoelectric switch to control the target rotation system and the planet fixture, and firstly succeeded in realizing the autocontrol of coating process. The soft is programmed by Visual Basic, and the interface is straight and operational.

关 键 词：时间监控 光电传感器 自动控制 光学薄膜 离子束溅射 

分 类 号：O484.41[理学—固体物理]