时间监控离子束溅射沉积光学薄膜的厚度修正  

Thickness modify of time-power monitoring of ion beam sputter depositing optical thin films

作　　者：刘洪祥[1] 李凌辉[1] 申林[1] 熊胜明[1] 张云洞[1] 

机构地区：[1]中国科学院光电技术研究所,四川成都610209

出　　处：《光学仪器》2004年第2期91-94,共4页Optical Instruments

摘　　要：通过单层和多层膜的实验模拟,研究了离子束溅射沉积速率和沉积时间的关系。在溅射镀膜的初始阶段,对于Ta2O5,沉积速率随时间增加而增大;对于SiO2,沉积速率随时间先显著地增加,随后逐渐地减小。结果表明,通过对高、低折射率各层的监控时间进行补偿,即可实现光学薄膜厚度的精确监控。In this paper, the rule of the deposition rate of films and the sputtering time was studied. In the preliminary stage of coating, for Ta_2O_5, its growth rate increases with the depositing time; but, for SiO_2, its growth rate increases firstly, and then decreases. Experiments showed that, by modifying the deposition time of the high-index and the low-index layers, this can realize the accurate thickness control of time-power monitoring of ion beam sputter depositing optical thin films.

关 键 词：时间监控 离子束溅射 光学薄膜 厚度修正 多层膜 单层膜 

分 类 号：O484[理学—固体物理]