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机构地区:[1]苏州大学物理科学与技术学院,苏州215006
出 处:《物理学报》2004年第5期1588-1593,共6页Acta Physica Sinica
基 金:国家自然科学基金 (批准号 :10 175 0 48)资助的课题~~
摘 要:以高纯石墨作靶、CHF3 Ar作源气体采用反应磁控溅射法制备了介电常数在 1 77左右的氟化类金刚石 (F DLC)薄膜 .拉曼光谱表明 ,源气体中CHF3相对流量、射频功率和工作气压的增加都会引起薄膜的D峰与G峰强度之比ID IG 减小 ,薄膜中链式 (烯烃 )结构比例的上升 .红外吸收光谱分析表明薄膜的主体骨架仍为芳香环式结构 .薄膜的性质如光学带隙和介电常数等不仅与氟含量有关 ,还与碳氟原子间的耦合形式和碳氟键的分布密切相关 .The fluorinated diamond-like carbon(F-DLC) films with low dielectric constant(k~1.77)were prepared by reactive magnetron sputtering using trifluoromethane (CHF 3) and Argon as source gases and pure graphite as a target. The intensity ratio I D/I G of Raman bands of disordered graphite(D-band) and graphite(G-band) of F-DLC films decreases with the decrease of source gas flow ratios Ar/CHF 3 and RF input power or working pressure,which indicates a decrease of the fraction of aromatic ring in the films. The Fourier transform infrared absorption spectra reveal that the skeleton of F-DLC films consists of aromatic rings. It is proposed that the properties evolution of F-DLC films such as optical band gap and relative dielectric constant depends on not only the content of fluorine atoms in the films but also C—F x bonding configurations and C—F x bonds distribution.
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