电寻址空间光调制器制作灰度掩模技术的研究  

Study on gray-scale masks manufacture with electrically addressed spatial light modulators

作　　者：谌廷政[1] 吕海宝[1] 漆新民[2] 高益庆[2] 朱小进[2] 

机构地区：[1]国防科学技术大学机电工程研究所,湖南长沙410073 [2]南昌航空工业学院测控系,江西南昌330034

出　　处：《光电工程》2004年第7期46-49,64,共5页Opto-Electronic Engineering

基　　金：江西省测试与控制中心基金资助项目( KG200104006)

摘　　要：介绍了制作微光学元件灰度掩模的两种方案,它们分别使用TFT-LCD(薄膜晶体管液晶显示器)和DMD(数字微镜器件)两种电寻址空间光调制器,采用并行直写和实时掩模技术,提高了灰度掩模制作的速度和灵活性。刷新率的变化和黑栅衍射效应将导致衍射效率下降,使得曝光深度误差增加。前者可延长曝光时间来消除,后者可通过高填充因子和放大滤波电路予以有效抑制。与LCD掩模相比,用DMD掩模制作的闪耀光栅的衍射效率提高了10%以上。Two schemes for fabricating micro-optics gray-scale masks are introduced, in which using two kinds of electrically addressed SLM (Spatial Light Modulators): TFT-LCD (Thin Film Transistor Liquid Crystal Display) and DMD (Digital Mirror Device), respectively, with parallel direct writing and real-time mask techniques, the speed and flexibility of gray-scale mask fabrication are improved . The variation of refresh rate and diffraction by opaque lattice will lead to reducing diffraction efficiency and this will increase exposure depth error. The former can be eliminated by prolonging exposure time and the latter can be inhibited effectively by selecting higher fill factor and adopting amplifying and filtering circuits. Compared with LCD mask, the diffraction efficiency of blazed grating made with DMD mask is improved by more than 10%.

关 键 词：灰度掩模 空间光调制器 衍射效率 微光学元件 

分 类 号：TN256[电子电信—物理电子学]