SCATTEROMETRY

作品数：5被引量：13H指数：2
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Analysis of Line-Edge Roughness Using EUV Scatterometry
《Nanomanufacturing and Metrology》2022年第2期149-158,共10页Analía Fernández Herrero Frank Scholze Gaoliang Dai Victor Soltwisch 
funding from the Electronic Component Systems for European Leadership Joint Undertaking under grant agreement No 826589|MADEin4;This Joint Undertaking receives support from the European Union’s Horizon 2020 research and innovation programme and The Netherlands,France,Belgium,Germany,Czech Republic,Austria,Hungary,and Israel;Open Access funding enabled and organized by Projekt DEAL.
Smaller and more complex three-dimensional periodic nanostructures are part of the next generation of integrated electronic circuits.Additionally,decreasing the dimensions of nanostructures increases the effect of lin...
关键词：Line-edge roughness LER LWR EUV scatterometry Debye-Waller factor 
Model-based characterisation of complex periodic nanostructures by white-light Mueller-matrix Fourier scatterometry被引量：1
《Light(Advanced Manufacturing)》2021年第3期31-44,共14页Maria Laura Gödecke Karsten Frenner Wolfgang Osten 
supported by the Deutsche Forschungsgemeinschaft(DFG,German Research Foundation)under grant number Os 111/50-1.
Optical scatterometry is one of the most important metrology techniques for process monitoring in high-volume semiconductor manufacturing.By comparing measured signatures to modelled ones,scatterometry indirectly retr...
关键词：SCATTER hence inverse 
Solving the inverse grating problem by white light interference Fourier scatterometry被引量：8
《Light(Science & Applications)》2012年第1期17-23,共7页Valeriano Ferreras Paz Sandy Peterhansel Karsten Frenner Wolfgang Osten 
We are thankful for the technical support given by Thomas Schoder.This work was supported by the German DFG-funded priority program(SPP1327)on‘Optically generated sub-100 nm structures for technical and bio-medical applications’within the subproject‘Development of a functional sub-100 nm 3D two-photon polymerization technique and optical characterization methods’and the DFG project‘Inverse-source and inverse-diffraction problems in photonics(OS111/32-1).’。
Scatterometry is a well-established,fast and precise optical metrology method used for the characterization of sub-lambda periodic features.The Fourier scatterometry method,by analyzing the Fourier plane,makes it poss...
关键词：Fourier scatterometry inverse problem optical sub-lambda metrology RCWA white light interference 
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