POLISHING

作品数：210被引量：349H指数：10
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相关领域：金属学及工艺更多>>
相关作者：辛企明康仁科霍凤伟金洙吉赵福令更多>>
相关机构：大连理工大学东华大学北京理工大学南昌大学更多>>
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相关基金：国家自然科学基金国家重点基础研究发展计划广东省自然科学基金河北省自然科学基金更多>>
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Damage threshold influenced by polishing imperfection distribution under 355-nm laser irradiation
《Chinese Physics B》2017年第10期265-270,共6页余振 齐红基 张伟丽 王虎 王斌 王岳亮 黄昊鹏 
A systematic interpretation of laser-induced damage in the nanosecond regime is realized with a defect distribution buried inside the redeposited layer arising from a polishing process. Under the 355-nm laser irradiat...
关键词：laser-induced damage size distribution photoactive imperfection 
Correlation of polishing-induced shallow subsurface damages with laser-induced gray haze damages in fused silica optics
《Chinese Physics B》2016年第8期421-425,共5页何祥 赵恒 王刚 周佩璠 马平 
Laser-induced damage in fused silica optics greatly restricts the performances of laser facilities. Gray haze damage,which is always initiated on ceria polished optics, is one of the most important damage morphologies...
关键词：laser-induced damage POLISHING subsurface damage fused silica 
Subsurface defect characterization and laser-induced damage performance of fused silica optics polished with colloidal silica and ceria被引量：1
《Chinese Physics B》2016年第4期413-417,共5页何祥 王刚 赵恒 马平 
This paper mainly focuses on the influence of colloidal silica polishing on the damage performance of fused silica optics. In this paper, nanometer sized colloidal silica and micron sized ceria are used to polish fuse...
关键词：POLISHING laser-induced damage fused silica colloidal silica 
Origin of high oxide to nitride polishing selectivity of ceria-based slurry in the presence of picolinic acid
《Chinese Physics B》2011年第3期497-504,共8页王良咏 刘波 宋志棠 刘卫丽 封松林 黄丕成 S.V Babu 
supported by the Center for Advanced Materials Processing (CAMP) at Clarkson University;the National Integrate Circuit Research Program of China (Grant No. 2009ZX02023-3);the National Basic Research Program of China (GrantNos. 2007CB935400,2010CB934300 and 2006CB302700);the National High Technology Development Program of China (GrantNo. 2008AA031402);the Science and Technology Council of Shanghai,China (Grant Nos. 08DZ2200700,08JC1421700 and09QH1402600);the Chinese Academy of Sciences Visiting Professorship for Senior International Scientists
We report on the investigation of the origin of high oxide to nitride polishing selectivity of ceria-based slurry in the presence of picolinic acid. The oxide to nitride removal selectivity of the ceria slurry with pi...
关键词：chemical mechanical polishing CERIA oxide over nitride selectivity ORIGIN 
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