相关期刊:《Plasma Science and Technology》《Frontiers of Information Technology & Electronic Engineering》《Acta Mathematica Sinica,English Series》《Chemical Research in Chinese Universities》更多>>
supported by the National Science Foundation for Young Scholars of China(No.11105092);the Shenzhen Science and Technology Development Funds(Nos.JC201005280565A,JC201005280558A,GJHS20120621142118853)
This paper investigates the total ionizing dose response of different non-planar triple-gate transistor structures with different fin widths. By exposing the pseudo-MOS transistor to different amounts of radiation, di...
Proposed herein is a novel non planar cell structure for flash memory which has been fabricated to achieve high programming speed with low operating voltage.This memory cell preserves a simple stacked gate structure ...