POST-OXIDATION

作品数:5被引量:5H指数:1
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相关领域:电子电信更多>>
相关机构:中国科学院微电子研究所更多>>
相关期刊:《Journal of Semiconductors》《Chinese Physics B》《Chinese Optics Letters》《Nano Research》更多>>
相关基金:国家自然科学基金更多>>
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Effect of post oxidation annealing in nitric oxide on interface properties of 4H-SiC/SiO_2 after high temperature oxidation被引量:1
《Journal of Semiconductors》2015年第9期58-61,共4页李妍月 邓小川 刘云峰 赵艳黎 李诚瞻 陈茜茜 张波 
Project supported by the National Natural Science Foundation of China(No.61234006);the State Grid of China(No.sgri-wd-71-14-003)
The interface properties of 4H-SiC metal oxide semiconductor (MOS) capacitors with post-oxidation annealing (POA) in nitric oxide (NO) ambient after high temperature (1300 ℃) oxidation have been investigated ...
关键词:C-V characteristics 4H-SiC MOS post-oxidation annealing SiC/SiO2 
Improvement of InGaAs/GaAs vertical-cavity surface-emitting lasers by post-oxidation annealing被引量:1
《Chinese Optics Letters》2012年第12期68-70,共3页晏长岭 邓昀 李鹏 宋小卯 史建伟 
supported by the National Natural Science Foundation of China under Grant Nos.60676025 and 61076038
InGaAs/GaAs vertical-cavity surface-emitting lasers (VCSELs) are fabricated by a thermal selective wet- oxidation confinement technique. Post-oxidation annealing in a nitrogen environment at high temperatures is the...
关键词:OXIDATION Surface emitting lasers Testing 
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