Project supported by the National Natural Science Foundation of China(No.61234006);the State Grid of China(No.sgri-wd-71-14-003)
The interface properties of 4H-SiC metal oxide semiconductor (MOS) capacitors with post-oxidation annealing (POA) in nitric oxide (NO) ambient after high temperature (1300 ℃) oxidation have been investigated ...
supported by the National Natural Science Foundation of China under Grant Nos.60676025 and 61076038
InGaAs/GaAs vertical-cavity surface-emitting lasers (VCSELs) are fabricated by a thermal selective wet- oxidation confinement technique. Post-oxidation annealing in a nitrogen environment at high temperatures is the...