ULTRA-SHALLOW

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相关领域：电子电信更多>>
相关作者：王家楫瞿欣更多>>
相关机构：复旦大学更多>>
相关期刊：《质谱学报》《真空科学与技术学报》更多>>
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Application of Ultra-shallow Seismic Survey to the Wanggezhuang Fault in Qingdao
《Earthquake Research in China》2018年第4期574-583,共10页Yang Qiyan You Huichuan Di Long 
sponsored by the PhD Research Foundation of Hebei GEO University(BQ2017027)
At present,there is less theoretical research and practical experience in the aspect of ultrashallow seismic exploration to the target layers at depths of only tens of meters both at home and abroad. Seismic explorati...
关键词：Ultra SHALLOW SEISMIC survey OBSERVATION system Wanggezhuang FAULT f-k FILTERING 
深亚微米IC超浅结的SIMS表征
《质谱学报》2005年第z1期13-14,共2页瞿欣 王家楫 
Secondary ion mass spectrometry (SIMS) is a standard technique for characterization of dopant distribution in semiconductor industry. In the ultra-shallow junction (USJ) application, the interested depth scale was ext...
关键词：SIMS ULTRA-SHALLOW JUNCTION LOW-ENERGY ion IMPLANT 
A STUDY OF SILICON AVALANCHE COLD MICRO-CATHODE USING ULTRA-SHALLOW PN+ JUNCTION
《真空科学与技术学报》1992年第Z1期239-242,共4页Li Qiong, Tang Shihao, Yaun Meiying, Xue Zheng, Xu Jingang Department of Electronics Science and Technology East China Normal University, Shanghai 200062 China Lin ChengluShanghai Institute of Metallurgy, Academia Sinica Chang Ning Road 865, Shanghai 200050 China Zhang Duan Wu Junlei Shanghai Vacuum Electrical Device Ltd. Jiao Zhou Road 485, Shanghai 200040 China  
The structure, fabrication and emission characteristics of a silicon cold micro-cathode using ultra-shallow PN+ junction are presented. Implantation of As+ with a energy around 12 kev, rapid thermal annealing combined...
关键词：JUNCTION A STUDY OF SILICON AVALANCHE COLD MICRO-CATHODE USING ULTRA-SHALLOW PN 
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