用于X射线光刻掩模的纳米金刚石膜成核研究  

Nucleation of Nano-Diamond Films for X-Ray Mask Substrates

作　　者：李东辉[1] 刘志凌[2] 叶甜春[1] 陈大鹏[1] 吕反修[2] 

机构地区：[1]中国科学院微电子所,北京100029 [2]北京科技大学材料系,北京100083

出　　处：《无机材料学报》2004年第4期887-894,共8页Journal of Inorganic Materials

摘　　要：介绍了金刚石膜在下一代X射线光刻掩模中应用的必要性;通过调节衬底温度,改变生长时间、控制甲烷浓度等工艺措施,实验研究了不同参数对成核密度及成核质量的影响,获得了高密度形核的样品;对形核后的预生长期进行了工艺优化,有效地控制了核岛的优势生长,总结出了一套优化的形核方案,即甲烷浓度4％,衬底温度700℃,形核时间14min;这套工艺不仅改善了自支撑金刚石薄膜窗口的光学性能,还有效地降低了膜的内应力。Diamond films are essential to next generation X-ray lithography mask. The affection of different process parameter to nucleation density and nucleation quality were investigated by controlling substrate-temperature, changing growth-time and CH4 concentration etc., and some high-density nucleation samples were obtainted. Mean time, pregrowth process after nucleation of diamond films was improved and dominant growth of major island was restrained effectively. The results show that the nucleation process can be optimized as 14% of CH4 concentration, 700degreesC of substrate-temperature, 14min of nucleation. The optical properties and stress distribution of free-standing diamond membranes can be improved greatly.

关 键 词：成核 金刚石薄膜 MPCVD X射线光刻掩模 

分 类 号：TB43[一般工业技术]