等离子体辅助热丝化学气相沉积金刚石复合膜  

Plasma-assisted Hot-filament Chemical Vapor Deposition of Diamond Composite Film

作　　者：毕京锋[1] 石玉龙[1] 付强[1] 

机构地区：[1]青岛科技大学材料与环境科学学院,山东青岛266042

出　　处：《青岛科技大学学报（自然科学版）》2004年第4期332-334,共3页Journal of Qingdao University of Science and Technology:Natural Science Edition

基　　金：山东省自然科学基金项目 (Y2 0 0 1F10 )

摘　　要：运用等离子体辅助热丝化学气相沉积设备分别进行了金刚石膜和金刚石 /碳化钛复合膜的沉积。实验条件 :甲烷流量与氢气流量比为 1∶5 0 ,基体温度 860℃ ,等离子体偏压 30 0V ,沉积气压 4kPa。运用扫描电子显微镜 (SEM )分别观察了沉积膜的表面和断面形貌 ;运用能量扩散电子谱 (EDX)对沉积的复合膜进行分析 ,观察到Ti元素峰和C元素峰 ;运用X射线衍射 (XRD)得到相应的金刚石衍射峰和碳化钛衍射峰。实验表明 。Diamond film and diamond/TiC composite film were coated by plasma-assisted hot-filament chemical vapor deposition. The deposition temperature was 860℃.The ratio of feed gas was CH (4)∶H (2) =1∶50. The bias-voltage of plasma was 300V and the deposition pressure was 4 KPa. The film characteristics were analyzed by SEM, EDX and XRD. It showed that good diamond composition film could be prepared by plasma-assisted hot-filament chemical vapor deposition.

关 键 词：金刚石膜 复合膜 化学气相沉积 

分 类 号：TB333[一般工业技术—材料科学与工程]