离子束溅射淀积光学薄膜的膜厚均匀性实验  

Uniformity of optical film prepared by ion beam sputtering

作　　者：李凌辉[1] 熊胜明[1] 申林[1] 刘洪祥[1] 张云洞[1] 

机构地区：[1]中国科学院光电技术研究所,四川成都610209

出　　处：《光电工程》2004年第B12期67-69,72,共4页Opto-Electronic Engineering

基　　金：国家 863 计划项目资助课题

摘　　要：介绍了离子束溅射技术改善薄膜均匀性的两种方法。研究了修正板技术,根据工程需要将修正板技术应用于行星转动条件下的光学薄膜的均匀性修正。分别研究了靶摆动和不摆动的情况下,淀积薄膜的均匀性修正。实验结果表明,修正后的均匀性结果优于 1%,能满足实际应用的要求;靶摆动修正的均匀性结果优于修正板技术。The method to improve the uniformity of thin film thickness through ion beam sputtering is described in the paper. According to the demands of engineering application, a technique has been developed to adjust the uniformity of thin film thickness under condition of planetary fixture in cases of target oscillation and non-oscillation. The experiments results show that the uniformity of Ta2O5 thin film is better than 1%. It can meet the requirement of application.

关 键 词：离子束溅射 Ta2O5薄膜 膜厚均匀性 修正板 

分 类 号：O484[理学—固体物理]