纳米光刻技术现状与进展  

The Development of Nanolithography

作　　者：耿磊[1] 陈勇[1] 

机构地区：[1]电子科技大学微电子与固体电子学院,成都610054

出　　处：《世界科技研究与发展》2005年第3期7-11,共5页World Sci-Tech R&D

摘　　要：随着纳米加工技术的发展,纳米结构器件必将成为未来集成电路的基础。纳米光刻技术是制作纳米结构的基础,具有重要的应用前景。文章介绍了几种极有潜力的下一代纳米光刻技术,包括极紫外光刻技术、电子束光刻技术、纳米压印光刻技术的新途径、发展现状和关键问题,最后讨论了纳米光刻技术的应用前景。With the development of nano- fabrication techniques, nano- devices will be the basis of the next generation of integrated circuit. The fabrication of nanostructures, an important part of nanotechnology, is based upon nanolithography which will be widely employed in the future. We shall describe the development and key issues of several very promising next generation nanolithography techniques including EUV lithography, PREVAIL lithography and nanoim print lithography. Prospective applications of nanolithography are discussed at the end.

关 键 词：纳米技术 纳米光刻 纳米结构制作 纳米光刻技术 现状与进展 纳米结构器件 极紫外光刻技术 电子束光刻技术 纳米加工技术 集成电路 

分 类 号：TG669[金属学及工艺—金属切削加工及机床]