深刻蚀高密度熔融石英光栅  

Deep Etched High-Density Fused Silica Phase Gratings

作　　者：王顺权[1] 周常河[1] 茹华一[1] 张妍妍[1] 

机构地区：[1]中国科学院上海光学精密机械研究所

出　　处：《中国激光》2006年第2期175-178,共4页Chinese Journal of Lasers

基　　金：国家杰出青年基金(60125512);上海市光科技行动计划(036105013);上海市优秀学科带头人计划(03XD14005)资助项目

摘　　要：深刻蚀高密度熔融石英光栅是一种新型高效的衍射光学元件,具有衍射效率高、成本低、抗损伤,能在高强度激光条件下工作等优点。给出了利用感应耦合等离子体(ICP)技术制作熔融石英深刻蚀光栅的详细过程,并在一定的优化条件下制作了一系列不同周期、开口比和深度的高质量深刻蚀石英光栅。实验得到的最大刻蚀深度为4μm,并且在600 l/mm的高密度条件下得到了刻蚀深度为1.9μm的高深宽比石英光栅。光栅侧壁陡直,表面平整,没有聚合物沉积。所制作的熔融石英光栅元件在高强激光环境、光谱仪、高效滤波器和波分复用系统等领域中有非常广泛的用途。Deep etched high-density fused silica grating is a new diffractive optical element with advantages of high diffraction efficiency, and low cost. In this paper, the detailed fabrication process of microoptical deep etched fused silica phase gratings is presented with inductively coupled plasma （ICP） technology. Deep etched phase gratings with different periods, depths, and duty cycles have been fabricated under an optimized etching condition. An etched depth of 1.9μm has been achieved on a grating with a high density of 600 lines/mm. The fabricated gratings have vertical sidewalls, planar surfaces with no polymer deposition. The biggest etched depth is about 4μm. The fabricated gratings are very useful optical elements in the fields such as intensive laser environment, spectrometer, high-efficient filter, and wavelength-division-multiplexing system, etc.

关 键 词：光栅 深刻蚀 感应耦合等离子体 熔融石英 

分 类 号：TN305.7[电子电信—物理电子学] O436.1[机械工程—光学工程]