LPCVD设备的高精度串级温度控制系统  

Cascade Temperature Control with High Accuracy in LPCVD Equipment

作　　者：宋玲[1] 廖炼斌[1] 张勇[1] 罗卫国[1] 

机构地区：[1]中国电子科技集团公司第四十八研究所,湖南长沙410111

出　　处：《电子工业专用设备》2006年第4期35-38,共4页Equipment for Electronic Products Manufacturing

摘　　要：在大部分半导体工艺中,温度都是最重要的工艺参数之一,炉温的均匀性和稳定度对工艺都有着至关重要的影响。主要介绍了LPCVD设备中的高精度串级温度控制系统,该系统结构简单,控制效果良好,温度稳定度≤±0.5℃/24h。Temperature is one of the most important parameters in the most semiconductor process. The uniformity and stability of furnace temperature have essential influence on the LPCVD process. This paper introduces the cascade temperature control with high accuracy in the LPCVD equipment. This system is simple in structure and good control result that its stability of temperature is not more than ±0. 5℃/24 h.

关 键 词：LPCVD 串级控制 温度控制 

分 类 号：TN304.055[电子电信—物理电子学]