热丝法化学气相沉积大面积金刚石膜中辐射场和温度场的尺寸效应  

SIZE EFFECT OF IRRADIANCE AND TEMPERATURE FIELDS IN LARGE AREA DIAMOND GROWTH BY HFCVD

作　　者：刘德义[1] 黄荣芳[1] 于杰[1] 闻立时[1] 师昌绪[1] 

机构地区：[1]中国科学院金属研究所

出　　处：《材料研究学报》1996年第3期279-284,共6页Chinese Journal of Materials Research

摘　　要：对热丝法化学气相沉积金刚石膜中的辐射场和温度场进行了计算结果表明，在样品平面沿Ｘ，Ｙ方向均匀辐照度（温度）区的线性尺寸比高温度梯度区的尺寸快速增大沿Ｚ方向均匀辐照度（温度）区的深度随样品到加热丝距离的增加而增大辐照度（温度）的大小可通过改变加热丝间距得到控制．Irradiance and temperature fields are calculated for large area diamond growth by HFCVD.The results show that linear size of uniform irradiance(temperature) region in X and Y directions in sample plane increases more quickly than that of region of high irradiance(temperature) gradient.Depth of uniform irradiance(temperature) region in Z direction increases with increasing heater-sample spacing.Irradiance(temperature) level can be controlled by variation of spacing between neighboring heating filaments.

关 键 词：辐照场 金刚石膜 HFCVD 薄膜生长 

分 类 号：TN304.18[电子电信—物理电子学] TN304.055