亚微米i线和g线投影光刻物镜研制  

DEVELOPMENT OF SUBMICRON i-LINE AND g-LINE PROJECTION LITHOGRAPHY LENS

作　　者：陈旭南[1] 林大键[1] 王效才[1] 

机构地区：[1]中国科学院光电技术研究所,成都610209

出　　处：《微细加工技术》1997年第2期23-30,共8页Microfabrication Technology

摘　　要：本文介绍了分步重复投影光刻机的i线和g线投影光刻物镜主要技术指标、设计要点、研制中解决的关键单元技术和设计试制结果。结果表明数值孔径NA＝0．42i线和NA＝0．45g线、视场15×15mm以及畸变＜±0．1μm的五倍缩小投影光刻物镜研制成功。The main specifications,design points,solved key unit techniques in research and the development results on i-line and g-line projection lithography lens of the stepper are reviewed. The results show that the 5x reduction projection lenses with numeral aperture NA= 0. 42 (i-line )and NA= 0. 45 (g-line),field size 15 X15mm and distortion less than 10. 1μm have been fabricated successfully.

关 键 词：光学曝光 投影光刻物镜 光刻机 

分 类 号：TN305.7[电子电信—物理电子学]