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作 者:朱京涛[1] 王占山[1] 王洪昌[1] 张众[1] 王风丽[1] 秦树基[1] 陈玲燕[1] 崔明启[2] 赵屹东[2] 孙丽娟[2] 周洪军[3] 霍同林[3]
机构地区:[1]同济大学物理系精密光学工程与技术研究所,上海200092 [2]中国科学院高能物理所同步辐射实验室,北京100039 [3]中国科技大学国家同步辐射实验室,安徽合肥230029
出 处:《光学精密工程》2007年第12期1886-1893,共8页Optics and Precision Engineering
基 金:Supported by the National Natural Science Foundation of China (No 60378021 and 10435050);the Programfor New Century Excellent Talents in University (No NCET-04-0376)
摘 要:研究了极紫外宽带多层膜偏振光学元件,包括反射式检偏器与透射式相移片。基于Mo/Si非周期多层膜结构,采用解析与数值优化相结合的方法进行了多层膜的设计;采用磁控溅射技术制备了多层膜。利用X射线衍射仪对非周期多层膜的结构进行了表征,利用德国BESSY-II同步辐射实验室的偏振测量仪对多层膜的偏振特性进行了测试。测量结果表明,在13 ~19 nm波段,s偏振分量的反射率高于15 %;在15 ~17 nm波段,获得了37 %的反射率。宽带多层膜同样可作为宽角偏振光学元件,在13 .8 ~15 .5 nm波段,宽带透射相移片的平均相移为41 .7°。采用所研制的宽带多层膜相移片与检偏器,建立了宽带偏振分析系统,并对BESSY-II的UE56/1 PGM1光束线的偏振特性进行了系统研究。这种宽带多层膜偏振光学元件可以极大地简化极紫外偏振测量。Broadband Mo/Si multilayer polarization optical elements were developed for the extreme ultraviolet (EUV) region, including a reflective analyzer and a transmission phase retarder. These multilayers were designed by a combined analytical/numerical method based on an aperiodic stack. Then these aperiodic multilayers were fabricated using direct-current magnetron sputtering technology. The multilayer structures were measured by an X-ray Diffractometer (XRD) working at the CuKα line, and the polarization response was characterized by the polarimeter on the UE56/1-PGM1 beamline at BESSY-II, in Berlin. The measured s-polarized reflectivity is higher than 15 % over the 13 -19 nm wavelength range,and nearly constant s-reflectivity, up to 37%, is observed over the 15-17 nm wavelength range. Furthermore, these aperiodic muhilayers show high s-reflectivity and polarization over a wide angular range at fixed wavelength. The measured phase shift is 41.7^o over the 13.8- 15.5 nm wavelength range. Using an aperiodic transmission phase retarder and a reflection analyzer, a complete broadband polarization analysis system was developed. The polarization properties of the synchrotron radiation from the beamline UE56/1 PGM1 at BESSY-II were systematically characterized in the 12.7-15.5 nm wavelength range by this newly developed broadband polarization analysis system. This kind of broadband multilayer polarizing elements can be used in EUV polarization measurements and will greatly simplify experimental arrangements.
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