铁刻蚀CVD金刚石膜辅助机械抛光  

Rail Etching CVD Diamond Films Auxiling Mechanical Polishing

作　　者：邢文娟[1] 汪建华[1] 满卫东[1] 严朝辉[1] 谢鹏[1] 

机构地区：[1]武汉工程大学湖北省微波等离子体化学与新材料重点实验室,湖北武汉430073

出　　处：《硬质合金》2007年第4期207-210,共4页Cemented Carbides

基　　金：湖北省科技攻关计划(2002AA105A02);湖北省高等学校优秀中青年科技创新团队资助项目

摘　　要：采用直流溅射方法在化学气相沉积(CVD)金刚石膜表面镀上一层铁薄膜,在氢等离子体条件下利用铁对金刚石膜的快速刻蚀实现初抛光,然后再进行机械抛光,提高抛光效率。Iron film was deposited on the surface of CVD diamond fill by direct-current spurting method. The diamond fill was polished coarsely because of iron＇s rapid etching with hydrogen plasma at the first step. And then it is polished by the mechanical technique, which improves the efficiency of polishing.

关 键 词：CVD 金刚石膜 微波等离子体 刻蚀 抛光 

分 类 号：TG580.692[金属学及工艺—金属切削加工及机床]