掺氮类金刚石薄膜的显微结构和光谱学研究  

Microstructures and Electronic Properties of Nitrogen Doped Diamond-Like C∶N Films

作　　者：李合琴[1] 何晓雄[1] 王淑占[1] 巫邵波[1] 赵之明[1] 

机构地区：[1]合肥工业大学材料科学与工程学院,合肥230009

出　　处：《真空科学与技术学报》2008年第3期225-229,共5页Chinese Journal of Vacuum Science and Technology

基　　金：安徽省自然科学基金(No.03044703);安徽省红外与低温等离子体重点实验室资助(No.2007C002107D)

摘　　要：本文利用射频磁控溅射法,以高纯N2、Ar混合气体为溅射气体,用高纯石墨靶在Si(100)基片上制备出掺氮的类金刚石薄膜(DLC∶N)。拉曼光谱(Raman)测试表明该薄膜仍然是类金刚石结构,对其进行拟合后得两个特征峰,分别是在1342.9 cm-1的D峰和1555.3 cm-1的G峰,ID/IG=0.45;X射线光电子能谱(XPS)表明薄膜含氮量为24%,XPS光谱的C1s和N1s的芯能级证实了薄膜中的碳氮进行了化合,形成了C-N、C=N、C≡N,说明薄膜中形成了非晶碳氮结构;傅里叶变换红外透射光谱(FTIR)也表明了薄膜中碳氮进行了化合;扫描电子显微镜(SEM)结果表明,实验所制备的薄膜表面均匀、致密、光滑,从横截面图像观察,薄膜与衬底结合紧密,薄膜的厚度大约为150 nm。Nitrogen doped,diamond-like carbon（DLC） films were grown by radio frequency（RF） magnetron sputtering of high purity graphite target, on Si（100） substrates. The microstructures and surface electronic properties of the DLC ：N films were characterized with scanning electron microscopy（SEM）, Raman spectroscopy, X-ray photoelectron spec- troscopy（XPS） ,and Fourier transform infrared spectroscopy（FTIR）.The results show that the fairly smooth compact film is identified to be the diamond-like carbon film with N concentration of 24%. Formation of C-N, C = N,and C≡N in the reaction of carbon and nitrogen, and strong adhesion at the interface of DLC ： N films and silicon substrate, were clearly observed. Possible mechanisms were also tentatively discussed.

关 键 词：射频磁控反应溅射 掺氮类金刚石薄膜 X射线光电子能谱 拉曼光谱 傅里叶变换红外透射光谱 扫描电子显微镜 

分 类 号：TB43[一般工业技术]