Mo/Si多层膜表面保护层设计  

Design of Capping Layers on Mo/Si Multilayer

作　　者：徐达[1] 朱京涛[1] 张众[1] 王风丽[1] 王晓强[1] 王洪昌[1] 蒋励[1] 佘仕凤[1] 王占山[1] 秦树基[1] 陈玲燕[1] 

机构地区：[1]同济大学精密光学工程技术研究所物理系,上海200092

出　　处：《光子学报》2009年第1期160-164,共5页Acta Photonica Sinica

基　　金：国家自然科学基金(10435050;10675092);国家863高技术研究与发展计划(2006AA12Z139)资助

摘　　要：为提高Mo/Si多层膜的稳定性与使用寿命,通过分析多层膜驻波电场的分布,对表面保护层及多层膜最上层材料的厚度进行优化设计,使优化后的反射率最高.计算表明,一定厚度的表面保护层总对应一个最优的最上层材料厚度.在13.36nm波长,膜对数为50的Mo/Si多层膜10度入射的理论反射率为74.47%;当添加厚度为2.3nm的Ru作为表面保护层,对应多层膜最上层Si的优化厚度为3.93nm,其理论反射率为75.20%.设计结果表明,通过优化设计表面保护层,可以提高多层膜稳定性,改善多层膜性能.In order to iraprove the stability and lifetime of Mo/Si multilayers,the design of capping layers on Mo/Si multilayer was investigated. By analyzing the electrical field distribution of multilayer standing wave,both the thicknesses of capping layer and uppermost material layer can be optimized to enable the highest reflectivity. Theoretical calculation shows that a certain thickness of the capping layer always corresponds to an optimized uppermost material thickness. A theoretical reflectivity of 74. 47% can be achieved at 13.36 nm for a typical Mo/Si multilayer consisting of 50 bi-layers at incident angle of 10°. Whena 2.3nm Ru layer is added as uppermost Si layer optimized research results indicate that capping layer onto the multilayer surface,meanwhile with the thickness of to 3. 93nm, the theoretical reflectivity will be improved the stability and performance of the multilayer can be to 75. 20%. The improved by the optimized design of capping layers.

关 键 词：薄膜光学 多层膜 表面保护层 驻波电场分布 反射率 

分 类 号：TB43[一般工业技术] O434[机械工程—光学工程]