CrTiAlCN多元多层梯度膜的制备及其结构  

Growth and microstructure of CrTiAlCN multi-composite thin films

作　　者：林松盛[1] 代明江[1] 朱霞高[1] 李洪武[1] 侯惠君[1] 林凯生[1] 况敏[1] 戴达煌[1] 

机构地区：[1]广州有色金属研究院材料表面工程研究所,广州510651

出　　处：《中国有色金属学报》2009年第2期259-264,共6页The Chinese Journal of Nonferrous Metals

基　　金：广东省技术创新基金资助项目(200503027)

摘　　要：采用中频反应磁控溅射、离子束辅助方法沉积CrTiAlCN多元硬质薄膜,利用扫描电镜、俄歇电子谱、透射电镜及X射线衍射等技术对膜层的过渡层、界面及微观结构进行研究。结果表明:沉积制备的膜层为多层梯度过渡结构,成分深度分布及相结构分析证实,所制备的多元多层梯度膜与所设计的基体/Cr/CrN/CrTiAlN/CrTiAlCN结构相吻合;在梯度过渡中,不同层之间界面体现为渐变过渡过程;沉积制备的多元多层梯度膜硬度高达26.31GPa,膜/基结合力大于80N,摩擦因数低至0.113,力学性能优良。CrTiAlN multi-composite hard films were deposited by ion beam assisted reactive mid-frequency magnetron sputtering. Auger electron spectroscopy, transmission electron microscopy, X-ray diffractometry and microhardness tester were used to investigate the interface, interlayer, mierostructure and composition of the multi-composite hard films. The results show that the multi-composite hard films contain multilayer gradient structure that coincides with the designed structure of substrate/Cr/CrN/CrTiAlN/CrTiAlCN, the composition distribution changes gradually between the interface in interlayer. The hard films exhibit good comprehensive performance with micro-hardness of 26.31 GPa, adhesion strength of 80 N and friction coefficient of 0.113.

关 键 词：CrTiAlCN薄膜 磁控溅射 离子束辅助 

分 类 号：O484[理学—固体物理]