反应磁控溅射碳化钒薄膜的微结构与力学性能  

Microstructures and Mechanical Properties of Vanadium Carbide Films Grown by Reactive Magnetron Sputtering

作　　者：李广泽[1] 乌晓燕[1] 陈扬辉[1] 李戈扬[1] 

机构地区：[1]上海交通大学金属基复合材料国家重点实验室,上海200030

出　　处：《真空科学与技术学报》2009年第2期168-172,共5页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金资助项目(No.U0774001)

摘　　要：在Ar、C2H2混合气氛中通过反应磁控溅射法制备了一系列不同碳含量的碳化钒薄膜,利用EDX、XRD、SEM、AFM和微力学探针表征了薄膜的微结构和力学性能。研究了C2H2分压对薄膜成分、相组成、微结构以及硬度和弹性模量的影响。结果表明,采用在Ar-C2H2混合气体中的射频反应磁控溅射技术可以方便地合成碳化钒薄膜。但是,只有在C2H2分压为混合气体总压约4%附近很窄的范围内才可获得力学性能优异的碳化钒薄膜。其硬度和弹性模量分别达到35.5GPa和358GPa,此时,薄膜为NaCl结构的VC,且具有柱状生长的特征。随着C2H2分压的提高,薄膜形成六方结构的-γVC,并逐渐产生非晶碳相,硬度和弹性模量随之降低。The vanadium carbide films with different carbon contents were deposited by reactive magnetron sputtering in Ar-G2H2 gaseous mixture on stainless steel substrates. The vanadium carbide films were characterized with X-ray diffraction（XRD）, X-ray energy dispersive spectroscopy（EDS）, scanning electron microscopy（SEM）, atomic force microscopy（AFM） and conventional mechanical probes. The impact of C2H2 partial pressure on mechanical properties, including its stoichiometries, phase structures, surface hardness and elastic modulus, was studied. The results show that the C2H2 partial pressure strongly affects the mechanical properties ot the film.At about 4% of C2H2 in the gaseous mixture, the hardness and elastic modulus of the films are 35.5GPa and 358GPa, respectively. The NaCl-type cubic crystalline structured, column-shaped grains were observed in the VC films. As the C2H2 partial pressure increases, the cubic phase changes into the hexagonal structured γ-VC phase, accompanied with an increasing amount of amorphous carbon, which results in a considerable decreases of both the surface hardness and elastic modulus.

关 键 词：碳化钒 硬质薄膜 微结构 力学性能 磁控溅射 

分 类 号：O484.4[理学—固体物理]