电子束曝光系统中精密工件台的测量系统  

Measurement System of Precision Stage for E-Beam Aligner

作　　者：严伟[1] 胡松[1] 杨勇[1] 周绍林[1] 蒋文波[1] 李艳丽[1] 乔俊仙[1] 

机构地区：[1]中国科学院光电技术研究所,成都610209

出　　处：《微纳电子技术》2009年第4期244-249,共6页Micronanoelectronic Technology

摘　　要：介绍了电子束曝光技术的原理。根据精密工件台对测量系统的需要,设计了三轴工件台测量系统布局方式,并简单介绍了激光干涉测量系统所需元器件数量的计算方法。重点讨论了双频激光干涉测量原理、双频光束与运动方向敏感性的关系以及读出装置信号处理方法。在此基础上,对研制的电子束曝光系统精密工件台进行了直线性和垂直性实验测试,其测量分辨率达到0.6nm,测量重复性精度达到±0.06μm,测量绝对误差达到0.011μm。结果表明,采用双频激光测量系统可确保工件台系统测量和定位准确性。The theory of the e-beam aligner was introduced. According to the needs of the precision stage for measurement system, a three-axis measurement method was employed, and the method of calculating the number of the components in measurement System was introduced. The followings were discussed which include the principle of dual-frequency laser interferometry, the sensitivity between the dual-frequency optical beam and moving orientation and the signal processing method of reading apparatus. The linearity and verticality test experiments show that the e-beam aligner has a precise performance with the resolution of 0.6 nm, the repeatability of ＋ 0.06μm and the measurement error of 0.011μm. The results indicate that the dual-frequency laser interferometer system can guarantee the accuracy of the stage in the e-beam aligner system.

关 键 词：电子束曝光机 激光干涉仪 精密工件台 光刻 方向敏感性 

分 类 号：TN305.7[电子电信—物理电子学]