影响金刚石薄膜生长因素的研究  

Investigation of Influence Factors on Diamond Film Growth

作　　者：邵淑敏[1] 吕向英[1] 于剑[1] 丁乐礼 席光康[1] 张猛[1] 周志强[1] 李胜林[1] 彭华军[1] 邵牟舟 

机构地区：[1]南开大学

出　　处：《真空》1998年第4期17-22,共6页Vacuum

摘　　要：本文用ＨＦＣＶＤ法对在硬质合金衬底上生长金刚石薄膜的诸多影响因素，如衬底的预处理、碳源浓度和热丝及衬底温度等进行了系统地研究并最终找出在该衬底上生长金刚石薄膜的最佳生长条件。Abstract Diamond coating on carboloy metal was prepared by HFCVD. It is found that many factors such as pretreatment of substrate, the concentration of acetone and the temperature of hot filament and substrate strongly influenced the growth process and properties of diamond film. Finally the best growth conditions of diamond coating on carboloy metal was found.

关 键 词：硬质合金衬底 金刚石 薄膜生长 HFCVD 

分 类 号：TB43[一般工业技术] TN304.180[电子电信—物理电子学]