新型微波等离子体化学气相沉积金刚石薄膜装置  

NEW MICROWAVE PLASMA CVD SET UP FOR DIAMOND FILM GROWTH

作　　者：吕庆敖[1] 邬钦崇[1] 隋毅峰[1] 匡靖安 周永成[1] 俞世吉 王守国 

机构地区：[1]中国科学院等离子体物理研究所

出　　处：《真空与低温》1998年第1期35-37,共3页Vacuum and Cryogenics

摘　　要：微波等离子体化学气相沉积（ＭＰＣＶＤ）是制备金刚石薄膜的一种重要方法。为了获得金刚石薄膜的高速率大面积沉积，在国内首次研制成功了５ｋＷ带有石英真空窗的天线耦合水冷却不锈钢反应室式ＭＰＣＶＤ装置。初步用该装置成功在硅基片上沉积得到了金刚石薄膜。Microwave plasma chemical vapor deposition (MPCVD) is an important methed for diamond film preparation.5 kW antenna coupled MPCVD setup with a quartz vacuum window and water cooled stainless steel reaction chamber for higher depositing rate and lager depositing square was developed in China for the first time.Diamond films were prepared on silicon substrates with this set up.

关 键 词：微波等离子体 化学气相沉积 金刚石 薄膜 

分 类 号：TN304.055[电子电信—物理电子学] TN304.18