亚半微米光刻投影物镜温度补偿控制及算法研究  

CONTROL AND ALGORITHM INVESTIGATION ON TEMPERATURE COMPENSATION OF SUB MICRON PROJECTION LITHOGRAPHY OBJECTIVE

作　　者：张津[1] 姚汉民[1] 陈旭南[1] 唐小平[1] 

机构地区：[1]中国科学院光电技术研究所

出　　处：《微细加工技术》1999年第2期71-78,共8页Microfabrication Technology

摘　　要：主要介绍一种光刻机投影物镜温度补偿控制的原理及控制算法。根据系统结构、对象特性和过程指标要求，采用了一种智能型线性－模糊控制器，获得了优良的动态和稳态性能。The principle and control algorithm of temperature compensation for Sub Micron projection lithography objectives are introduced. Akind of intelligent linear fuzzy controller is developed according to the system structure and object's dynamic feature and the targets of processing. The excellent dynamic and stationary features are gained.

关 键 词：投影物镜 温度补偿 光刻 大规模集成电路 

分 类 号：TN407.57[电子电信—微电子学与固体电子学]