采用真空磁控反应溅射和热水氧化法制备AlN_xO_y增透膜  

Preparation of Transmittance-Increasing AlN_xO_y Film by Vacuum Magnetron Reactively Sputtering and Hydrothermal Oxidation Method

作　　者：池华敬[1] 熊凯[1] 郭帅[1] 许丽[1] 王双[1] 陈革[1] 章其初[1] 

机构地区：[1]皇明太阳能股份有限公司镀膜研发中心,德州253000

出　　处：《真空科学与技术学报》2011年第5期652-655,共4页Chinese Journal of Vacuum Science and Technology

摘　　要：在3.2mm厚的低铁玻璃衬底上采用金属Al靶在溅射气体Ar和反应气体N2的混合气体中,真空磁控反应溅射沉积半透明的Al-AlN金属陶瓷薄膜。再将沉积该薄膜的玻璃试样浸入沸腾的去离子水中,经一定时间氧化后,制备成表面粗糙的AlN和Al2O3的陶瓷混合物增透膜AlNxOy。在3.2 mm厚的低铁玻璃上,溅射沉积厚度为120 nm的Al-AlN金属陶瓷薄膜,沸水氧化8 min,制备的单面增透膜AlNxOy试样的太阳透射比Te达93.5%,可见光透射比Tv达95.2%。制备的双面增透膜AlNxOy试样的Te,Tv进一步提高,Te高达95.6%,与未镀膜玻璃衬底的90.4%相比,增加了5.2%;Tv高达97.0%,与玻璃衬底的91.6%相比,增加了5.4%。The translucent Al-AlN cermet thin film are deposited on 3.2 mm thickness low-iron glass substrate by magnetron reactive sputtering using Al target in the atmosphere of Ar and N2.The transmittance-increasing film of AlNxOy with surface roughness are made after hydrothermal oxidation in boiling pure water for a certain time.For a 3.2 mm thickness low-iron glass with a AlNxOy film obtained by oxidation a 120 nm thickness Al-AlN film in boiling water for 8 min,the measured solar light transmittance Te is 93.5%,and the visible light transmittance Tv is 95.2%.For a glass that both sides is coated,Te and Tv are 95.6% and 97% respectively,while for uncoated glass,the two values are 90.4% and 91.6%.

关 键 词：增透膜 反应溅射 沸水氧化 薄膜 金属陶瓷 Al-AlN ALN AL2O3 AlNxOy 

分 类 号：TK513.3[动力工程及工程热物理—热能工程]