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机构地区:[1]哈尔滨工业大学航天学院,黑龙江哈尔滨150001 [2]哈尔滨工业大学超精密光电仪器工程研究所,黑龙江哈尔滨150001
出 处:《电机与控制学报》2013年第1期71-76,共6页Electric Machines and Control
基 金:国家科技重大专项资助项目(2009ZX02207)
摘 要:光刻机的工件台是高动态精密伺服运动平台,它要求在系统高速运动的同时,采用长行程直线电机宏动跟随音圈电机高精密微动的驱动方式,实现系统纳米级的精确定位及跟踪。为减小微动电机的运动范围和加速度,必须提高直线电机的跟踪精度。针对该系统的直线电机模型设计了一种线性自抗扰控制方法,该方法的控制器首先通过扩张状态观测器观测系统的动态变化,补偿系统中的各种扰动,再运用前馈对系统的跟踪误差进行补偿,减小系统的动态跟踪误差。在此复合控制方式下,控制器实现了自抗扰控制,前馈控制器很好的补偿了误差,从而提高了系统的抗干扰和跟踪性能。实验表明,该方法与传统的控制方法相比,改善了系统的动态性能和抗干扰能力。The wafer stage of lithography is high dynamic precision servo motion platform. An nm-level positioning precision is required by using macro movement of long stroke linear motor and high-precision micro movement of voice coil motor, while the platform is moving in high-speed. In order to reduce the movement scope and acceleration of voice coil motor, the tracking precision of linear motor must be im- proved. A linear active disturbance rejection controller design for linear motor was presented. The con- troller was designed through an extended state observer to estimate the system' s state and the external disturbance. To improve the tracking performance of the dynamic system, the tracking error was added to the reference input and used as feed-forward error compensation. Under such a combined control method, the controller has the ability of active disturbance rejection, the feed-forward error compensation controller compensates tracking error well, and the disturbance rejection and tracking control performances are thus enhanced. The experiments show the control system synthesis procedures and a substantial improvement over the tracking error generated by the traditional control method alone.
关 键 词:光刻机 工件台 直线电机 线性自抗扰 前馈补偿 高动态精密伺服
分 类 号:TP273.3[自动化与计算机技术—检测技术与自动化装置]
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