MPCVD纳米金刚石膜的微观结构及显微力学特性分析  

The Analysis of Micro-structrue and Mechanical behavior of Nano-diamond Film produced by Microwave Plasma Chemical Vapor Deposition

作　　者：杨武保[1] 吕反修[1] 唐伟忠[1] 刘玉龙[2] 朱克 

机构地区：[1]北京科技大学材料科学与工程学院 [2]中科院物理所光物理开放实验室

出　　处：《中国表面工程》2000年第4期19-21,共3页China Surface Engineering

基　　金：国家863项目基金

摘　　要：利用微波等离子体化学气相沉积技术在光学玻璃衬底上制备了金刚石膜，利用原子力显微镜技术及显微力学探针研究了膜层的表面形貌及显微力学特性。结果表明，金刚石膜的晶粒尺寸小于100 nm，表面粗糙度小于10 nm，具有极高的显微硬度及弹性模量，能够满足光学材料表面的抗冲击、耐磨等要求。Lubricous compact and symmetrical diamond films were deposited on glass by MPCVD.It showed that, the surface roughness measured by AFM,was less than 10nm,the the grain size was less than 100 nm,the films surface was quite lubricous. Excellent characteristics of surface mechanical behavior were measured by the nanoindentation methud.

关 键 词：金刚石膜 表面形貌 显微力学特性 MPCVD 

分 类 号：TG174.444[金属学及工艺—金属表面处理] O484[金属学及工艺—金属学]