用于承载铷原子钟滤光泡的高品质微腔体制备  

Fabrication of high-quality micro-cavity for filter cell of rubidium atomic clock

作　　者：王婷婷[1,2] 曾毅波[2,1] 王盛贵[1,2] 魏秀燕[1,2] 毕瑞可 郭航[2,1] 

机构地区：[1]厦门大学物理与机电工程学院,福建厦门361005 [2]厦门大学萨本栋微米纳米技术研究院,福建厦门361005

出　　处：《传感器与微系统》2014年第5期106-110,共5页Transducer and Microsystem Technologies

基　　金：福建省重大科技项目前期研究计划资助项目(2005HZ1021)

摘　　要：在芯片级铷原子钟中,需要微腔体来承载Rb—87滤光泡,为此,提出了一种用于制作高品质微腔体的新技术。为了获得光滑的腔体侧面和避免腐蚀过程中凸角处产生削角现象,研究中采用了超声腐蚀技术和凸角补偿技术。首先,分别在纯KOH溶液,并结合搅拌和超声等方法,对(100)硅片进行湿法腐蚀,并运用激光共聚焦扫描显微镜对腐蚀后的{111}表面进行粗糙度测量,表明运用超声腐蚀技术可以获得光滑的{111}腔体侧面。在此基础上,引入条形掩模凸角补偿方法进行微腔体腐蚀。实验结果表明:在80℃、质量分数为30%KOH、超声频率和功率分别为59 kHz和160 W的溶液中腐蚀,其{111}腐蚀表面粗糙度为0.117μm,同时条形的长度取1200μm时,可以获得平滑规整的微腔体。In chip-scale rubidium atomic clock, the Rb-87 fiher is required to be loaded in micro-cavity, so present a new technology for fabrication of the high-quality micro-cavity. In order to gain smooth side surfaces,i, e. Si（ 111 ）plane, of micro-cavity and to avoid undercutting at the concave corner, ultrasonic etching and concave corner compensation techniques are used. First, silicon（ 100 ）wafer is wet etched in the pure KOH etching solution with ultrasonic and stirring, and the roughness of Si { 111 } wet-etched surface is measured by laser scanning confocal microscope （LSCM）. On this basis,a strip mask compensation method for concave corner is adopted for micro-cavity etching. The results show that the etched Si { 111}surface roughness can achieve 0. 117 μm（RMS） in mass fraction 30 % KOH etching solution at 80 ℃ with ultrasonic frequency of 59 kHz and power of 160 W, and when the strip length is 1200 μm, smooth micro-cavity can be obtained.

关 键 词：微腔体 铷原子钟 各项异性湿法腐蚀 超声腐蚀 激光共聚焦扫描显微镜 凸角补偿 

分 类 号：TH742.64[机械工程—光学工程]