同步辐射Laminar光栅的研制  

Fabrication of Laminar grating for synchrotron radiation

作　　者：徐向东[1] 洪义麟[1] 霍同林[1] 周洪军[1] 陶晓明[1] 傅绍军[1] 

机构地区：[1]中国科学技术大学国家同步辐射实验室,安徽合肥230026

出　　处：《光学技术》2001年第5期459-461,468,共4页Optical Technique

摘　　要：采用全息离子束刻蚀和反应离子刻蚀相结合的新工艺 ,在熔石英基片上成功地刻蚀出 2 0 0l/mm、线空比 4:6、槽深 70nm、刻划面积 60× 2 0mm2 的浅槽矩形Laminar光栅。对改进光栅线条粗糙度和线空比的方法进行了系统的研究。这一新工艺相对简单 。A fused silica grating of 200 l/mm, ratio of the land to groove 4:6, groove depth 70nm, ruled area 60×20 mm 2 was fabricated by a new technique, which combines holographic ion beam etching and reactive ion etching Methods to improve edge roughness control the land groove ratio and groove depth are also investigated The fabrication technique developed here is a relatively simple in that reduces rigorous demands to interference system optics, exposure and development time

关 键 词：Laminar光栅 全息光刻 离子束刻蚀 反应离子刻蚀 同步辐射 

分 类 号：TH744.12[机械工程—光学工程]