无马达驱动的旋转圆柱形磁控溅射器  

Rotating Cylindric Magnetron with No Motor Drive

作　　者：黄士勇[1] 曲凤钦[1] 苗晔[1] 钟玉荣[1] 孟兆坤[1] 傅胜奇[1] 

机构地区：[1]烟台大学物理系,烟台264635

出　　处：《真空科学与技术》2001年第5期416-418,共3页Vacuum Science and Technology

摘　　要：在大型薄膜连续生产线中 ,磁控溅射器的溅射速率、使用周期是影响生产效率与成本的重要因素。本文提出一种新型的无马达驱动的具有高溅射速率、高靶材利用率、长的靶使用周期、安装与使用简单的磁控溅射器。可广泛应用于各类大。Limited deposition rate and limited life time of the target are the bottlenecks in industrial production of thin films by magnetron sputtering with the conventional planar magnetron.A novel type of rotating cylindrical magnetron has been successfully developed to solve these problems.Its technical advantages are as follows:no driving motor needed,high sputtering deposition rates,long life time of target,and easy installation and operation.A specially designed water cooling system can also serve as a vacuum seal between the cathode and the vacuum chamber and the rotation driver of the target.This new technique will find wide industrial applications.

关 键 词：磁控溅射 水冷系统 旋转圆柱形磁控溅射器 薄膜 生产设备 

分 类 号：TB43[一般工业技术]