MEMS螺线管型电感器正负胶结合的加工工艺  

Process for MEMS Solenoid Type Inductor Using both Positive and Negative Photoresists

作　　者：吴茂松[1] 杨春生[1] 茅昕辉[1] 赵小林[1] 蔡炳初[1] 

机构地区：[1]上海交通大学微纳米科学技术研究院信息存储研究中心,上海200030

出　　处：《微细加工技术》2002年第2期53-57,共5页Microfabrication Technology

摘　　要：MEMS螺线管型电感器由于具有很多优点 ,其用途或潜在用途相当广泛。为了获得高质量的MEMS螺线管型电感器 ,在充分利用SU - 8特点的基础上 ,结合使用正胶AZ - 4 0 0 0系列和负胶SU - 8系列 ,新开发了UV -LIGA多层微加工工艺 ,它主要包括 :在基片上溅射Cr/Cu作为电镀种子层 ,涂布正胶 ,紫外光刻得到电镀模具 ,电镀Cu和FeNi分别得到线圈的下层、中层和上层以及铁芯 ;在完成下层和中层后 ,分别进行一次负胶工艺以形成电绝缘层和后续结构的支撑平台 ,即涂布负胶覆盖较下层结构 ,光刻开出通往较上一层的通道并使SU - 8聚合、交联以满足性能要求。实验表明该工艺是可行和实用的。它除了可用于螺线管电感器的加工 ,还可以用来加工其它三维结构的MEMS器件。MEMS solenoid type inductor has been or will be used in many fields because of its advantages. In order to fabricate high quality MEMS solenoid type inductor, we developed a new UV-LIGA multilayer micromachining process using both positive photoresist (AZ-4000 series) and negative photoresist (SU-8 series) and taking full advantages of SU-8.The process mainly includes sputtering Cr/Cu on the top of substrate as electroplate seed layers,spinning positive photoresist layers and then patterning the electroplate molds with UV lithography,electroplating Cu or FeNi to form the bottom,middle and top parts of the coil and the magnetic core,respectively,before micromachining every upper level of the device,performing a negative photoresist process to get the electrically insulating and supporting layer,that is,spinning a negative photoresist layer on the later layer and then patterning to form the conductor vias and to make the photoresist layer crossconnected.The experiment shows that the new process is practical.It can also be used to micromachine other three-dimensional MEMS devices.

关 键 词：MEMS 螺线管型 电感器 正负胶结合 加工工艺 SU-8 微加工 

分 类 号：TM55[电气工程—电器]