Al_2O_3感光薄膜的制备及其微细图形化研究  

Fabrication of Al_2O_3 photosensitive films and micro-patterning microstructures

作　　者：王哲哲[1] 赵高扬[1] 林林[1] 冯卓宏[1] 郑志强[1] 

机构地区：[1]福建师范大学物理与能源学院,福建省量子调控与新能源材料重点实验室,福州350117

出　　处：《功能材料》2014年第12期12079-12082,12087,共5页Journal of Functional Materials

基　　金：国家自然科学基金青年科学基金资助项目(51202033;11204039);福建省科技厅(K)类资助项目(JK2011008);校管资助项目(IRTL1203)

摘　　要：提出一种利用感光溶胶-凝胶法结合紫外光刻技术制备Al2O3微细图形的方法。以Al(O-SecBu)3为前驱物,β-二酮类配体H(C10H12O2)为化学修饰剂,合成了稳定的、具有良好感光性的含Al金属螯合物,进而制备出相应的感光薄膜。研究了薄膜的紫外和红外光谱特性及其在紫外光辐照条件下的变化过程,结果表明金属螯合物薄膜在251,321和368nm处各存在较强的紫外吸收峰。随着紫外光照时间的增加,吸收峰下降,Al2O3/H薄膜表现出明显的感光特性。结合紫外光刻技术,可制备出不同形状尺寸的Al2O3微细图形,其最小线宽可达437nm。In this paper,an novel approach for fabricating Al2O3 microstructure based on photosensitive sol-gel and UV laser lithography was introduced.Stabilized and UV photosensitive Al-contained metal chelate and thin films were prepared with Al（O-Sec-Bu）3 and H（C10H12O2） as the precursor and chemical modifier,respectively.The characteristics of UV and IR spectra of the films and their variations in the process of UV irradiation were investigated.The results showed that the gel films had absorption peaks at about 251,321 and 368nm due to the formation of chelate complex.These peaks gradually decreased with irradiation in time,which indicated the photosensitive properties of the Al2O3/H gel films.several size and profile Al2O3 micro-patterning were fabricated by using UV lithography and the minimum line-size obtained in this paper was about 437 nm.

关 键 词：AL2O3薄膜 感光溶胶-凝胶 化学修饰 激光干涉 微细图形 

分 类 号：TB34[一般工业技术—材料科学与工程] TB43