光刻材料的发展及应用  

Development and Application of Lithography Materials

作　　者：庞玉莲[1] 邹应全[1] 

机构地区：[1]北京师范大学化学学院,北京100875

出　　处：《信息记录材料》2015年第1期36-51,共16页Information Recording Materials

摘　　要：简述了光刻技术及光刻材料的发展过程及发展趋势,对光刻技术在集成电路和半导体分立器件的微细加工以及印刷电路板、平板显示器、触摸屏等制作过程中的应用进行了概述。并重点围绕光刻胶在集成电路制造中的应用,对其反应机理、应用性能等进行了阐述。同时还对光刻材料的市场特别是中国市场的现状及前景做了一定分析。This article reviews the development process and the development trend of lithography and photoresist .It also describes the application of lithography technology in the production process in the micro fabrication of IC （integrated circuit） and discrete semiconductor devices and PCB （printed circuit board）, fiat panel display, touch screen. And focus on the application of the photoresist in integrated circuit manufacturing, described their reaction mechanism and application performance .We also do some analysis on the photoresist mar-ket Situation and Prospects

关 键 词：光刻技术 光刻材料 光刻胶 抗蚀剂 市场前景 

分 类 号：TQ31[化学工程—高聚物工业]