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机构地区:[1]中国科学院光电技术研究所,四川成都610209
出 处:《红外与激光工程》2015年第B12期183-188,共6页Infrared and Laser Engineering
摘 要:利用国内最大箱式高真空镀膜设备ZZS3600,开展了双离子束辅助反应蒸发技术及光学薄膜厚度均匀性研究。借助MarkⅡ离子源辅助反应蒸发技术,对Ta_2O_5、SiO_2常见的高、低折射率光学薄膜进行了制备与特性分析。结果表明:在蒸发源与沉积基底距离较大的镀膜环境下,具有低能、高束流密度离子源有利于薄膜结构的致密化,薄膜性能的改善。根据大口径光学元件尺寸,结合真空室空间几何配置,开展了行星及单轴转动方式下镀膜膜厚均匀性的研究。行星转动方式下,分析了直径140 cm行星盘工件膜厚均匀性,无修正挡板运行时膜厚不均匀性优于0.4%。单轴转动方式下,分析了200 cm光学元件膜厚均匀性,并通过设计修正挡板将膜厚不均匀性控制在0.6%以内。采用双离子束辅助反应蒸发技术有利于实现高性能大口径光学薄膜的制备。Optical coatings were fabricated by ion assisted deposition technology based on the largest platform of ZZS3600 high vacuum coating machine. Properties of the deposited films as well as thickness uniformity were researched. The familiar optics as Ta_2O_5 and SiO_2 were produced by the ion bombardment of MARK Ⅱ ion sources. Several properties related with the optical coatings were analyzed. It suggests that great improvement achieved of the coating structure and properties of the deposited coatings under the condition that the distance between the substrate and the evaporation sources are extremely large. Based on the geometric configurations of the platform, the coating uniformity research of planetary system and single axis coating system were performed, respectively. The thickness nonuniformity is better than 0.4% without mask under the planetary system. As for single axis system,the thickness nonuniformity can be obtained less than 0.6%. High-quality large optical coatings can be acquired with the aid of double ion sources.
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