光刻胶纳米结构失效现象的光学特性分析  

Optical Characteristic Analysis of the Failure Phenomena of Photoresist Nanostructure

作　　者：柏杨[1,2] 张晓波[2] 熊瑛[2] 刘刚[2] 田扬超[2] 

机构地区：[1]中国科学技术大学精密机械与精密仪器系,安徽合肥230026 [2]中国科学技术大学国家同步辐射实验室,安徽合肥230029

出　　处：《新技术新工艺》2016年第9期66-69,共4页New Technology & New Process

基　　金：国家重点基础研究发展计划(973计划)项目(2012CB825804)

摘　　要：具有纳米结构的光刻胶有着独特的光学特性,其纳米结构参数直接决定其光学特性。通过对光栅脊柱倾斜、粘连和倒伏堆叠这3种结构失效现象建模,利用严格耦合波理论数值,计算了各种失效结构对偏振光的反射率影响。结果表明,脊柱倾斜的纳米光栅对于偏振光反射率最小的波长发生红移;当有粘连时纳米光栅的对偏振光的敏感程度减弱,同时产生衍射级次;倒伏堆叠的纳米光栅产生较强的衍射级次。利用偏振改变与失效形式的关系可以对纳米结构的具体失效形式做出判断,这对于实现微纳结构的无损监测有一定的推动意义。Photoresist nanostructure owns unique optical property, and the structural parameters directly affect the optical property. Structural failure occurrs in nano-grating with material in photoresist, such as spine tilt, collapse and adhe- sion, and its influence on the reflectivity of polarized light is researched. Through the modeling of three kinds of structural failure phenomena, the influence of various failure structures on the reflectivity of polarized light is calculated rigorous cou- pled wave theory. The results show that when nano-grating is tilted, the minimum wavelength to reflectivity of polarized light is shifted to red. When adhesion, the sensitivity of polarized light decreases and the diffraction orders are produced. Collapsed nano-gratings produce strong diffraction orders. The failure mode of nanostruetures can be judged according to the relationship between polarization change and failure mode. It is significant to realize the nondestructive monitoring of micro- nanostruct ures.

关 键 词：微纳加工 结构失效 严格耦合波分析 偏振 

分 类 号：TH74[机械工程—光学工程]