一种牺牲层工艺中金属电极保护方法研究（英文）  

A Method of Metal Electrode Protection in Sacrificial Etching Process

作　　者：张照云[1,2] 唐彬[1,2] 彭勃[1,2] 陈颖慧[1,2] 熊壮[1,2] 苏伟[1,2] 

机构地区：[1]中国工程物理研究院电子工程研究所,四川绵阳621999 [2]中国工程物理研究院超精密加工重点实验室,四川绵阳621999

出　　处：《电子器件》2017年第1期1-5,共5页Chinese Journal of Electron Devices

基　　金：The Laboratory of Precision Manufacturing Technology of CAEP under Grant(ZZ14007,ZZ16003)

摘　　要：为了在牺牲层工艺中保护金属电极不被腐蚀,提出了一种利用铝层保护金属电极的方法。在试验中采用了两种铝保护层厚度300 nm和1μm,在两种腐蚀液体4NH4F∶1HF∶2甘油和1HAC∶1NH4F中进行了试验,通过试验表明,铝金属层在两种腐蚀液体中都能够有效保护金属电极,延长牺牲层的腐蚀时间。最后,通过SOI微加速度计加工工艺进一步验证了该方法的有效性。In order to protect the metal electrode in sacrificial etching process, a method of using is aluminum layer to protect metal electrode is proposed. Two thick aluminum layers （one is 300 nm, the others is 1 μm）to protect metal electrode were studied in two etchants, one is 4NH4F ： 1HF ：2 glycerol and the other is 1HAC ：INH4F. Through the experiment, the metal pad can be kept in good condition after a long etching time through the protection of aluminum layer. Finally, this method is tested effective through SOI accelerometer fabrication.

关 键 词：微电子机械系统 微加速度计 牺牲层刻蚀 金属电极保护 

分 类 号：TN305.7[电子电信—物理电子学]