静电力作用下微机械结构的位移特性分析  

The Displacement Characteristics of the Micromechanical Structures Driven by Electrostatic Force

作　　者：杨恒[1] 鲍敏杭[1] 沈绍群[1] 李昕欣[1] 任建军[1] 

机构地区：[1]复旦大学电子工程系

出　　处：《复旦学报（自然科学版）》1999年第3期282-288,共7页Journal of Fudan University：Natural Science

基　　金：国家自然科学基金重点项目;国家传感器重点实验室资助课题

摘　　要：分析了在微机械传感器与执行器中常用的３种微机械结构在静电力作用下的静态位移特性，并对典型结构进行了数值计算。结果显示对质量块平动的双端固支梁岛结构在静电力作用下极板的最大平衡位移正好为无静电力时极板间距的１／３。Analyzed are the static displacement characteristics of three most widely used microstructures in silicon micromechanical sensors and actuators,i.e. double supported beam mass structure,cantilever beam structure and torsional bar structure, which are driven by electrostatic force. The results show that the maximum displacement of the double supported beam mass structure is equal to one third of the original gap between electrodes without electrostatic force, but the maximum displacements at the middle points of electrodes for the other two structures are smaller than one third of the original gap between the electrodes without electrostatic force.

关 键 词：静电力 微机械结构 位移特性 静电驱动 传感器 悬臂梁结构 扭转结构 

分 类 号：TP212[自动化与计算机技术—检测技术与自动化装置] TN4[自动化与计算机技术—控制科学与工程]