浅谈光刻胶  

A brief introduction of the photoresists

作　　者：王怡臻 

机构地区：[1]宏威上海分公司

出　　处：《记录媒体技术》2010年第2期40-42,共3页China Mediatech

摘　　要：近几十年间,微电子技术得到了迅猛的发展。根据摩尔定律,集成电路的集成度每隔两年翻一番。制作当今集成电路高分辨率线路元件的核心技术就是微刻技术,而其中的光刻术用于制造目前几乎所有商业元件,光刻胶为在介质表面构造精细的微米或亚微米级线路结构又起到了非常重要的作用。这篇文章将对光刻胶做一个简要介绍,并对当前的市场情况做一个简短概括。In the past decades,the evolution in microelectronics technology has progressed at an astonishing rate.According to the Moore's Law,the number of electrical components per(Integrated Chip) IC chip was doubling every two years.The key technology used to generate the high resolution circuit elements of today's IC is the microlithographic technology.This is particularly true of photolithographic techniques that are used to make almost all of the commercial devices,and the photoresists play the main part to form the micron or submicron patterned features on a surface to construct such subtle structures.In this paper,a brief introduction of the current photoresists is presented along with a short overview of nowadays market situation.

关 键 词：光刻胶 介质表面 亚微米级 线路结构 微刻 高分辨率 摩尔定律 光刻技术 光刻机 光致抗蚀剂 

分 类 号：TN405[电子电信—微电子学与固体电子学]