多点实时光刻机光源照度均匀度检测系统设计  

Design of Multi-Point Real-Time Lithography Light Source Uniformity Detection System

作　　者：赵可为 谭艾英[2] 尹韶云[2] 蔡文涛[2] 杨若夫 陈建军 佟首峰[1] Zhao Kewei;Tan Aiying;Yin Shaoyun;Cai Wentao;Yang Ruofu;Chen Jianjun;Tong Shoufeng(Key Laboratory of Optoelectronic Measurement ＆ Control and Optical Information Transfer Technology, Ministry of Education, Changchun University of Science and Technology, Changchun, Jilin 130022, China;Center of Integrated Optoelectronic Technology, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, Chongqing 400714, China)

机构地区：[1]长春理工大学光电测控与光信息传输技术教育部重点实验室,吉林长春130022 [2]中国科学院重庆绿色智能技术研究院集成光电中心,重庆400714

出　　处：《激光与光电子学进展》2018年第6期218-223,共6页Laser & Optoelectronics Progress

基　　金：国家自然科学基金(61605208;61475199);重庆市重点产业共性关键技术创新专项项目(2015zdcy-ztzx70006)

摘　　要：提出了一种光刻机照度均匀度多点测量方法,该方法利用紫外增强PIN光电二极管,同时快速测量曝光机照面多点的光强,通过在传统电流-电压放大电路的基础上进行改进,同时使用复合放大的方法,大大提高了曝光机照度均匀度多点测量方法的重复性,使每一测量单点测量重复性控制在0.02mW/cm2。利用紫外增强PIN光电二极管光刻机光源进行实验,结果表明,多点测量一致性小于0.1mW/cm2,且检测的照度均匀性符合要求。A multi point measurement method for illuminance uniformity of lithography machines is proposed. The method of using ultraviolet （UV） enhanced PIN photodiode can rapidly measure the light intensity of the exposure machine, and the combination of improvement on the basis of traditional current-voltage amplifying circuit and composite amplification greatly improves the repeatability of exposure machine illuminance uniformity multi-point measurement method, and makes every single point measurement repeatability of measurement below 0.02 mW/cm^2. Experimental results show that with the use of UV enhanced PIN photodiode exposure machine light source, multi-point measurement consistency is less than 0.1 mW/cm^2 , and the detection of the illuminance uniformity meets the requirements.

关 键 词：测量 照度均匀度 多点测量 光刻技术 光刻机 实时检测 

分 类 号：TH741[机械工程—光学工程]