多层金刚石薄膜的制备研究  

THE RESEARCH OF PREPARATION OF MULTILAYER DIAMOND FILMS

作　　者：陈义 汪建华[1,2] 刘繁[1] 翁俊[1] CHEN Yi;WANG Jian-hua;LIU Fan;WENG Jun(Key Laboratory of Plasma Chemistry and Advanced Materials of Hubei Province,Wuhan Institute of Technology Materials Science and Engineering,Wuhan 430074,China;Institute of Plasma Physics,Chinese Academy of Sciences,Hefei 230031,China)

机构地区：[1]武汉工程大学材料科学与工程学院湖北省等离子体化学与新材料重点实验室,武汉430074 [2]中国科学院等离子体物理研究所,合肥230031

出　　处：《真空与低温》2016年第6期350-353,共4页Vacuum and Cryogenics

基　　金：国家自然科学基金项目(11175137);湖北省教育厅科学技术研究计划优秀中青年人才项目(Q20151517);武汉工程大学科学研究基金项目(K201506)

摘　　要：利用微波等离子体化学气相沉积法,以H_2/CH_4/CO_2为混合气源,在Si基底上分别沉积了单层微米、纳米以及三层(膜层结构为微米层(MCD)/纳米层(NCD)/微米层(MCD))金刚石薄膜。利用Raman光谱、扫描电子显微镜(SEM)和X射线衍射(XRD)表征金刚石膜,以得到样品质量、表面形貌、晶粒尺寸等信息。结果表明:微米金刚石晶薄膜粒粗大,表面粗糙,纳米金刚石薄膜晶粒细小,表面平整,生长过程中控制反应参数,可以制备出多层金刚石膜,三层结构的引入,可以明显降低表面粗糙度。Monolayer microcrystalline diamond,nanocrystalline diamond and three-layer(the structure of films is micron layer(MCD)/nanolayers(NCD)/micron layer(MCD))diamond films were deposited on Si substrate with H2/CH4/CO2 gas mixtures as source using microwave plasma chemical vapor deposition method respectively. The quality,surface morphology and grain size of diamond films were systematically characterized by Raman spectroscopy,scanning electron microscopy(SEM)and X-ray diffraction(XRD). The results show that microcrystalline diamond with coarse grains and rough surface,nanocrystalline diamond with fine grain size and surface roughness,multilayer diamond films can be prepared by control of the reaction parameters in the growth process,can significantly reduce the surface roughness by the introduction of three-layer structure.

关 键 词：微波等离子体 化学气相沉积 金刚石膜 

分 类 号：TQ164[化学工程—高温制品工业]